Resin Removal
Chemical decapsulation strips epoxy molding compound from packaged integrated circuits to expose bond wires and silicon dies for failure analysis. Concentrated nitric acid or sulfuric acid dissolves thermoset polymers at controlled elevated temperatures without attacking gold wire or silicon substrates. Acid selection depends on mold filler composition, since silica particles resist chemical attack while the resin matrix degrades into soluble fragments.
Chemical delivery systems manage reagent flow and temperature ramps to prevent thermal shock fractures in ceramic or plastic package bodies. Residual acid traces require thorough solvent rinsing and ultrasonic cleaning before microscopic examination or electrical probing begins.
Wire Integrity
Acid exposure duration determines whether fragile intermetallic bonds and aluminum bond pads survive the etching process intact. Excessive exposure times cause severe pad corrosion and wire lift, while insufficient digestion leaves polymer residue obscuring internal anomalies. Etched samples undergo optical and scanning electron microscopy to verify that fine wire loops remain undamaged by chemical action.
Process technicians monitor acid bath degradation spectrophotometrically to maintain consistent etch rates across successive sample batches.
Package Dissection
Mechanical decapsulation employs precision milling machines to grind away mold compound from specific package regions before chemical treatment finishes the exposure. Milling depths are calibrated against X-ray radiography maps to stop micrometers above the silicon die surface. Localized heating during mechanical grinding softens the polymer matrix, which risks smearing debris across exposed bond wires if cutter speed and feed rates exceed material thresholds.
Ultrasonic baths remove abraded polymer dust from milled cavities prior to final chemical cleaning. Destructive physical analysis relies on precise decapsulation sequences to isolate latent manufacturing defects without introducing artifact damage.