Removal Physics
High-energy optical photons vaporize target dielectric materials during microvia formation through rapid photothermal and photochemical interactions. Precision tuning of laser ablation dynamics prevents copper target pad damage while clearing resin and glass fibers from the blind hole cavity. The mechanism controls energy transfer across ultraviolet and carbon dioxide laser wavelengths during blind via drilling.
Thermal limits bound the technique, as excessive heat diffusion chars surrounding resin matrices and distorts hole geometry.
Beam Energy
Ultraviolet lasers disrupt chemical bonds in unreinforced resin using short duration pulses, while carbon dioxide lasers melt and vaporize woven glass reinforcement yarns. Pulsed laser beams strike the board surface with peak power levels reaching kilowatt densities for nanosecond intervals. Pulse repetition rate and spot overlap dictate dielectric removal speed across the circuit panel.
Excessive laser pulse energy causes copper splash on the bottom capture pad, creating an irregular surface that impedes electroless copper plating adhesion. Insufficient energy leaves resin residue at the via floor, resulting in high contact resistance after plating.
Taper Control
Microvia side-wall slope angles depend on beam power density distribution and material absorption coefficients. Laser ablation dynamics determine whether microvias form clean, uniform sidewalls suitable for downstream chemical desmear and electroplating steps.