
Microvia Plating Fatigue under Thermal Cycling
Microvia plating fatigue under thermal cycling stems from z-axis CTE mismatch, requiring ductile copper plating and continuous resistance monitoring to prevent field failures.

Microvia plating fatigue under thermal cycling stems from z-axis CTE mismatch, requiring ductile copper plating and continuous resistance monitoring to prevent field failures.

Thermal cycles in high density stackups drive copper recrystallization, causing grain growth and vacancy coalescence that trigger microvia interface failures.

Sub-0.15mm microvia target pad interface fatigue scales nonlinearly with z-axis CTE mismatch and target pad offset, demanding thick base copper and equiaxed plating.

Microvia aspect ratios capped at 0.75:1 with optimized acid copper throwing power deliver maximum plating yield and thermomechanical reliability in HDI stackups.
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