Deposition Method
Autocatalytic chemical reduction enables the creation of a continuous metallic layer on non-conductive surfaces within a multilayer board. Electroless copper forms the essential conductive path inside drilled holes, linking various internal signal layers together. This process relies on a controlled bath of chemical salts and reducing agents to plate the dielectric wall without an external electrical current.
Precise alkalinity and temperature maintenance control the rate of deposition to avoid structural voids or bridge defects.
Process Requirement
Thickness levels usually measure between twenty and forty microinches to provide sufficient coverage for subsequent galvanic plating. Fabricators confirm this depth through cross sectioning and microscopic measurement of the hole barrel. Variations in chemical concentration create thin spots that fail during thermal shock or reflow cycles.
Boards with incomplete coverage suffer from open circuits once the panel enters the final assembly stages.
Inspection Boundary
Optical verification detects large gaps or discoloration on the hole wall surface immediately after the line exit. Backlight testing exposes light transmission through areas of thin copper, showing potential weak zones before the panel reaches the etching stage. Heavy reliance on this thin chemistry requires constant bath titration to prevent metal flakes from contaminating the active surface.
A uniform appearance across the board indicates a stable deposit that successfully bridges the dielectric gap between conductive layers.